MODEL 650 Low Speed Diamond Wheel Saw

The Model 650 Low Speed Diamond Wheel Saw is a compact, multipurpose, precision saw designed to cut a wide variety of materials with minimal subsurface damage. It's low speed makes it possible to cut fragile materials that would otherwise fracture and soft materials that would load the diamond wheel on a higher speed saw. A variety of sample holders provides a means for mounting any shape sample while goniometer adaptability simplifies cutting oriented crystals.

Special Lapping Fixtures

The South Bay Technology Precision Lapping and Polishing Fixtures are designed to accurately produce polished parallel, tapered or critically oriented samples with minimal sub-surface damage. A series of specialized fixtures has been developed for lapping and polishing samples up to 8 in. in diameter. TEM samples and oriented crystals.  In addition to size and shape, the fixtures differ in the type of thickness control techniques they employ. The lapping and polishing fixtures are designed to be used either by hand or with a lapping machine.

MODEL 550 - Jet Thinning Instrument for TEM Samples

The Model 550D Single Vertical Jet Electropolisher is designed to perform damage free thinning of materials for subsequent analysis in a Transmission Electron Microscope. This extremely versatile instrument can be used to thin metals and alloys electrolytically with corrosive electrolytes such as perchloric acid at low temperatures; or to thin nonmetals and semiconductors such as silicon and gallium arsenide, chemically, using nitric acid, hydrofluoric acid or bromine-methanol solutions. Any solution that doesn not harm the PVC plastic, or the glass or plastic reservoirs can be used.

MODEL 310 - Disc Punch

The Model 310 Disc Punch is designed to prepare ductile metals and soft materials for TEM without mechanical distortion. Solid construction and high tolerance design allow maximum force to be used with difficult materials while maintaining specimen quality. A specimen alignment fixture is included which guarantees maximum specimen yield and precise specimen location. After the disc is punched it is automatically ejected from the die and collected in an easily removable tray. The precise construction of every unit guarantees sharp edges and easy disc ejection even after long term use.

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Sample Mounting

The proper mounting of samples is a critical step in the lapping and polishing process. It is imperative that the sample is firmly mounted parallel to the sample mount surface to ensure accurate results. Typically, samples are mounted using a low melting point wax as an adhesive and a Sample Mounting Fixture to apply uniform pressure. Sample Mounting Fixtures are designed to both monitor the temperature of the wax and to provide a uniform mounting pressure.

MODEL 900 - 8" Grinder/Polisher

The lightweight Model 900 - 8" Grinding/Polishing Wheel is ideal for surface preparation of small metallographic specimens. The Model 900 is a variable speed unit with an operating range of 0 - 1725 RPM. This flexibility allows for high speed rough grinding and low speed final polishing. The Model 900 is designed for long life. It's molded plastic housing will never rust, and the 1/3 HP, fully grounded motor with electronic speed control is designed for regular laboratory use. A metal splash guard has been added that can be used as a hand rest when using our tripod polisher or our other lapping fixtures.

MODEL PCPT - PLASMA TRIMMER™

Patent Pending

The PCPT Plasma Trimmer™ is an accessory for the PC2000 Plasma Cleaner. It is used with the PC2000 Plasma Cleaner to remove ion damage from FIB and Ion Milled Tripod Polished samples. The Plasma Trimming™ process not only removes the damage layers, but provides an oxide-free sample which can be preserved and shipped in the included SampleSaver™ storage container.

MODEL 550 - Jet Thinning Instrument for TEM Samples

TThe Model 550D Single Vertical Jet Electropolisher is designed to perform damage free thinning of materials for subsequent analysis in a Transmission Electron Microscope. This extremely versatile instrument can be used to thin metals and alloys electrolytically with corrosive electrolytes such as perchloric acid at low temperatures; or to thin nonmetals and semiconductors such as silicon and gallium arsenide, chemically, using nitric acid, hydrofluoric acid or bromine-methanol solutions. Any solution that doesn not harm the PVC plastic, or the glass or plastic reservoirs can be used.

MODEL PE2000 - Plasma Etcher

The PE 2000 RF Plasma Etcher is specifically designed for reactive gas plasma etching and surface treatments. The unit is capable of 150 watts RF forward power at 13.56 MHz and up to four gas processing. The system is ideal for R&D applications where single sample processing is needed and total control of each process parameter is necessary. Processes such as photoresist strip, BPSG removal, oxide and nitride layer etch, surface treatment of plastics and plasma cleaning are typical applications. Samples up to 6" diameter as well as irregular shaped substrates can be accommodated in the 200mm diameter vacuum chamber. A fully manual control system coupled with digital readouts and integral matching network with switching type power generator offer a wide range of experimental etch parameters.

MODEL PC2000 - Plasma Cleaner

It has been well documented that low energy plasmas can be used to reactively etch or remove organic materials found on the surface of inorganic materials. This technology has been used by the industrial community to clean semiconductor wafers and optical materials for many years. A related technique is now being implemented in the field of electron microscopy, where specimens can become contaminated during the preparation process or from other sources. Current analytical instruments use tightly focused, intense beams that create carbon deposits on the specimen surface due to organic contamination. The PC2000 is designed to simultaneously clean the specimen and specimen stage, which minimizes, and in many cases, eliminates contamination of the specimen being analyzed. The specimen holder and specimen are subjected to reactive gas plasma prior to electron microscope analysis.